Innovating science for over 125 years

Gas Plasma Reactor



Compact, barrel type low temperature ashing device designed with a large chamber made of quartz considered almost completely resistant against most plasma processes


  • Compact, space saving design with oscillation section integrated with a portion of the chamber
  • Outstanding operability and safety with the automatic tuning system as standand component
  • Equipped with a large quartz chamber (ø215mm) which can process big testing sampless


  • Removal of photoresist
  • Cleaning of parts
  • Surfactant treatment
  • Micro polishing
  • Corresponds to wafer and glass substrate
ModelPR500 (Flow meter)PR510 (Mass flow meter)
MethodBarrel type chamber direct plasma
High frequency outputMax. 500W
Oscillating frequency13.56MHz
Tuning methodAutomatic tuning
Reaction chamberMade of quartz, ø215×305mm
Reaction gasDual system (O₂ / CF₄)
Control systemManualAutomatic touch panel
Piping materialStainless steel, Teflon
External dimensions W×D×H438×520×760 mm520×630×760 mm
Power source 50/60HzAC115V / AC220V
Standard accessoriesConnection table (1 complete set), vacuum grease (1 pc.), o-ring for reaction chamber (1 pc.)
Optional accessoriesFrame for wafers (2, 3, 4, 5, 6 inches), multi-purpose angled frame, aluminum etching tunnel, stand


Click on the links below to download the associated PDFs.

PR500/510 Catalog

To download Operational Manual, visit our Technical Support Center